Nonthermal Plasma Chemistry and Physics provides a comprehensive presentation of the basics of plasma physics as well as new developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamental elementary processes in plasma chemistry. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films.
